EUV Tube for metrology
The characterization and quality control of multilayer mirrors, masks and optical components for the extreme ultraviolet lithography requires a compact, stable and debris-free light source. Laser nanoFab GmbH offers such a light source for metrology, which is based on the electron-induced characteristic emission of solid targets.- Microfocus EUV tube for at-wavelength reflectometry
- Electron-based EUV source
- Debris-free operation
- Long-term stable, low fluctuations
- EUV power of about 20µW (2π sr, 2% bw)
- Compact footprint
- very low running costs
- automatic start-up
- computer-controlled
Figure: Direct EUV Tube emission spectrum (green), and spectrum after two multilayer mirror reflections (blue)