EUVT2 - Debris free EUV-Source

The EUV tube provided by Laser nanoFab GmbH is a compact and user-friendly extreme ultraviolet (EUV) source for metrology. The source is based on advanced microfocus X-ray tube technology that has been extended to the EUV spectral range. The EUV emission is generated by electrons colliding with solid state targets. This concept guarantees debris-free operation, well-defined performance characteristics and excellent long-term temporal and spatial stability.

EUV POWER

At present, EUV powers of up to 20 μW (2π sr, 2% bw) are achieved.

STABILITY

The EUV source has excellent long-term stability. In continuous operation the fluctuations were measured over a period of three days and typically less than 1%.

SOURCE SIZE

The source size is below 10 µm and can be varied via operation voltage and current. Source sizes of 100 μm and more are possible (full width at half-maximum).

INTERFACE

The EUV tube comes with a standard vacuum flange, so connection to your vacuum setup is easy. The EUV emission cone is centered on the flange axis.

OPEN DESIGN

Customer-specific adaptations are possible.

APPLICATIONS

► At-wavelength characterization of EUV optical components, 
     e.g. multilayer mirrors, masks, or filters
► Off-synchrotron calibration of EUV tools, 
     e.g. spectrographs and energy monitors
► EUV imaging and microscopy with high lateral resolution

KEY FACTS

► Compact set-up, easy and intuitive operation
► Debris-free operation
► Excellent long-term temporal and spatial stability
► Very low running costs
► Computer-controlled (start-up, centering, focusing, operation)